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Showing results 1 to 9 of 9

SCIESCOPUS
Effect of gas mixing ratio on etch behavior of ZrO2 thin films in BCl3/He inductively coupled plasma

Kim, Mansu; Min, Nam-Ki; Yun, Sun Jin; Lee, Hyun Woo; Efremov, Alexander; Kwon, Kwang-Ho

ArticleIssue Date2008CitationJOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, v.26, no.3, pp 344 - 351PublisherA V S AMER INST PHYSICS
SCIESCOPUS
Effect of gas mixing ratio on etch behaviors of Ba2Ti9O20 (BTO) and Pt thin films in Cl-2/Ar inductively coupled plasma

Efremov, Alexander; Min, Nam-Ki; Kim, Sungihl; Kim, Mansu; Nahm, Sahn; Kwon, Kwang-Ho

ArticleIssue Date2008CitationMICROELECTRONIC ENGINEERING, v.85, no.7, pp 1584 - 1589PublisherELSEVIER SCIENCE BV
SCIESCOPUS
Etch mechanism of Ba(2)Ti(9)O(20) dielectric thin film in inductively coupled Cl(2)/Ar plasma

Efremov, Alexander; Kim, Mansu; Min, Nam-Ki; Kwon, Kwang-Ho

ArticleIssue Date2008CitationJOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.155, no.6, pp D468 - D473PublisherELECTROCHEMICAL SOC INC
SCIESCOPUS
Etching Characteristics and Mechanism of InP in Inductively Coupled HBr/Ar Plasma

Lee, Hyun Woo; Kim, Mansu; Min, Nam-Ki; Efremov, Alexander; Lee, Chi-Woo; Kwon, Kwang-Ho

ArticleIssue Date2008CitationJAPANESE JOURNAL OF APPLIED PHYSICS, v.47, no.8, pp 6917 - 6922PublisherJAPAN SOCIETY APPLIED PHYSICS
SCIESCOPUS
Etching characteristics of Al2O3 thin films in inductively coupled BCl3/Ar plasma

Yun, Sun Jin; Efremov, Alexander; Kim, Mansu; Kim, Dae-Won; Lim, Jung Wook; Kim, Yong-Hae; Chung, Choong-Heui; Park, Dong Jin; Kwon, Kwang-Ho

ArticleIssue Date2008CitationVACUUM, v.82, no.11, pp 1198 - 1202PublisherPERGAMON-ELSEVIER SCIENCE LTD
SCIESCOPUS
Model-based analysis of the silica glass film etch mechanism in CF(4)/O(2) inductively coupled plasma

Kim, Mansu; Min, Nam-Ki; Efremov, Alexander; Lee, Hyun Woo; Park, Chi-Sun; Kwon, Kwang-Ho

ArticleIssue Date2008CitationJOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS, v.19, no.10, pp 957 - 964PublisherSPRINGER
SCIESCOPUSKCI
Model-based analysis of the ZrO2 etching mechanism in inductively coupled BCl3/Ar and BCl3/CHF3/Ar Plasmas

Kim, Mansu; Min, Nam-Ki; Yun, Sun Jin; Lee, Hyun Woo; Efremov, Alexander M.; Kwon, Kwang-Ho

ArticleIssue Date2008CitationETRI JOURNAL, v.30, no.3, pp 383 - 393PublisherWILEY
SCIESCOPUS
On the etching mechanism of ZrO2 thin films in inductively coupled BCl3/Ar plasma

Kim, Mansu; Min, Nam-Ki; Yun, Sun Jin; Lee, Hyun Woo; Efremov, Alexander; Kwon, Kwang-Ho

ArticleIssue Date2008CitationMICROELECTRONIC ENGINEERING, v.85, no.2, pp 348 - 354PublisherELSEVIER
SCIESCOPUS
Prognostic model for predicting Alzheimer's disease conversion using functional connectome manifoldsopen access

Kim, Sunghun; Kim, Mansu; Lee, Jong-eun; Park, Bo-yong; Park, Hyunjin

ArticleIssue Date2024CitationALZHEIMERS RESEARCH & THERAPY, v.16, no.1PublisherBMC
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