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Improved reliability of Ti/ZrN/Pt resistive switching memory cells using hydrogen postannealing

Authors
Kim, Hee-DongYun, Min JuHong, Seok ManAn, Ho-MyoungKim, Tae Geun
Issue Date
Jul-2013
Publisher
A V S AMER INST PHYSICS
Citation
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, v.31, no.4
Indexed
SCIE
SCOPUS
Journal Title
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
Volume
31
Number
4
URI
https://scholar.korea.ac.kr/handle/2021.sw.korea/102926
DOI
10.1116/1.4813792
ISSN
1071-1023
Abstract
The authors investigated the effects of hydrogen postannealing on data retention and set/reset current variation in a Ti/ZrN/Pt resistive switching memory cell. Annealing the Ti/ZrN/Pt sample in a N-2+H-2 ambient gas versus a N-2 ambient gas reduced the set currents from 10.4 to 4.1 mA and the reset currents from 1.2 to 0.2 mu A, whereas the current ratio increased from similar to 9 x 10(3) to similar to 2 x 10(4). In addition, current variations in the set and reset states decrease at temperatures of 25 and 85 degrees C (>10yr) due to reduction of the interface trap by hydrogen passivation effects. (C) 2013 American Vacuum Society.
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