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Low-temperature electrical characterization of junctionless transistors

Authors
Jeon, Dae-YoungPark, So JeongMouis, MireilleBarraud, SylvainKim, Gyu-TaeGhibaudo, Gerard
Issue Date
2월-2013
Publisher
PERGAMON-ELSEVIER SCIENCE LTD
Keywords
Junctionless transistors (JLTs); Scattering mechanisms; Implantation induced defects; Flat-band voltage (V-fb); Threshold voltage (V-th)
Citation
SOLID-STATE ELECTRONICS, v.80, pp.135 - 141
Indexed
SCIE
SCOPUS
Journal Title
SOLID-STATE ELECTRONICS
Volume
80
Start Page
135
End Page
141
URI
https://scholar.korea.ac.kr/handle/2021.sw.korea/104132
DOI
10.1016/j.sse.2012.10.018
ISSN
0038-1101
Abstract
The electrical performance of junctionless transistors (JLTs) with planar structures was investigated under low-temperature and compared to that of the traditional inversion-mode (IM) transistors. The low-field mobility (mu(o)) of JLT devices was found to be limited by phonon and neutral defects scattering mechanisms for long gate lengths, whereas scattering by charged and neutral defects mostly dominated for short gate lengths, likely due to the defects induced by the source/drain (S/D) implantation added in the process. Moreover, the temperature dependence of flat-band voltage (V-fb), threshold voltage (V-th) and subthreshold swing (S) of JLT devices was also discussed. (C) 2012 Elsevier Ltd. All rights reserved.
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