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Browsing by Baek, Kyu-HaAuthor

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Showing results 1 to 13 of 13

SCISCIESCOPUS
Dual etch processes of via and metal paste filling for through silicon via process

Ham, Yong-Hyun; Kim, Dong-Pyo; Park, Kun-Sik; Jeong, Ye-Sul; Yun, Ho-Jin; Baek, Kyu-Ha; Kwon, Kwang-Ho; Lee, Kijun; Do, Lee-Mi

ArticleIssue Date2011CitationTHIN SOLID FILMS, v.519, no.20, pp 6727 - 6731PublisherELSEVIER SCIENCE SA
SCISCIESCOPUS
Effect of Gas Mixing Ratio on Etch Behavior of Y2O3 Thin Films in Cl-2/Ar and BCl3/Ar Inductively Coupled Plasmas

Kim, Moonkeun; Efremov, Alexander; Hong, MunPyo; Min, Nam Ki; Park, Hyung-Ho; Baek, Kyu-Ha; Kwon, Kwang-Ho

ArticleIssue Date2010CitationJAPANESE JOURNAL OF APPLIED PHYSICS, v.49, no.8PublisherIOP PUBLISHING LTD
SCISCIESCOPUS
Formation of Metal and Dielectric Liners Using a Solution Process for Deep Trench Capacitors

Ham, Yong-Hyun; Kim, Dong-Pyo; Baek, Kyu-Ha; Park, Kun-Sik; Kim, Moonkeun; Kwon, Kwang-Ho; Shin, Hong-Sik; Lee, Kijun; Do, Lee-Mi

ArticleIssue Date2012CitationJOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, v.12, no.7, pp 5897 - 5901PublisherAMER SCIENTIFIC PUBLISHERS
SCIESCOPUSKCI
Improvement of Light Out-Coupling Efficiency in Organic Light-Emitting Diodes with Variable Nanopatterns

Kim, Jeong Ho; Cho, Joong-Yeon; Park, Jaehoon; Lee, Bong Kuk; Baek, Kyu-Ha; Lee, Heon; Do, Lee-Mi

ArticleIssue Date2014CitationELECTRONIC MATERIALS LETTERS, v.10, no.1, pp 27 - 29PublisherKOREAN INST METALS MATERIALS
SCIESCOPUSKCI
Inductively-Coupled Nitrous-Oxide Plasma Etching of Parylene-C Films

Shutov, D. A.; Kang, Seung-Youl; Baek, Kyu-Ha; Suh, Kyung-Soo; Kwon, Kwang-Ho

ArticleIssue Date2009CitationJOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.55, no.5, pp 1836 - 1840PublisherKOREAN PHYSICAL SOC
SCIESCOPUS
Influence of Ar and NH3 Plasma Treatment on Surface of Poly(monochloro-para-xylylene) Dielectric Films Processed in Oxygen Plasma

Shutov, Dmitriy A.; Kang, Seung-Youl; Baek, Kyu-Ha; Suh, Kyung Soo; Kwon, Kwang-Ho

ArticleIssue Date2008CitationJAPANESE JOURNAL OF APPLIED PHYSICS, v.47, no.8, pp 6970 - 6973PublisherIOP PUBLISHING LTD
SCIESCOPUS
Kinetics of Chemical Changes in Phenol Formaldehyde Based Polymeric Films Etched in N2O and O-2 Inductively Coupled Plasmas: A Comparative Study

Kwon, Kwang-Ho; Min, Nam-Ki; Kang, Seung-Youl; Baek, Kyu-Ha; Suh, Kyung Soo; Shutov, Dmitriy Alexandrovich

ArticleIssue Date2009CitationJAPANESE JOURNAL OF APPLIED PHYSICS, v.48, no.8PublisherIOP PUBLISHING LTD
SCISCIESCOPUS
Metal/Dielectric Liner Formation by a Simple Solution Process for through Silicon via Interconnection

Ham, Yong-Hyun; Kim, Dong-Pyo; Baek, Kyu-Ha; Park, Kun-Sik; Kim, Moonkeun; Kwon, Kwang-Ho; Lee, Kijun; Do, Lee-Mi

ArticleIssue Date2012CitationELECTROCHEMICAL AND SOLID STATE LETTERS, v.15, no.5, pp H145 - H147PublisherELECTROCHEMICAL SOC INC
SCIESCOPUS
Model-Based Analysis of Plasma Parameters and Active Species Kinetics in Cl(2)/X (X = Ar, He, N(2)) Inductively Coupled Plasmas

Efremov, Alexander; Min, Nam-Ki; Choi, Bok-Gil; Baek, Kyu-Ha; Kwon, Kwang-Ho

ArticleIssue Date2008CitationJOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.155, no.12, pp D777 - D782PublisherELECTROCHEMICAL SOC INC
SCIESCOPUS
Neural network characterization of plasma-induced charging damage on thick oxide-based metal-oxide-semiconductor device

Kim, Byungwhan; Kwon, Sang Hee; Kwon, Kwang Ho; Kang, Sangwoo; Baek, Kyu-Ha; Lee, Jin Ho

ArticleIssue Date2009CitationJOURNAL OF APPLIED PHYSICS, v.105, no.11PublisherAMER INST PHYSICS
SCIESCOPUS
Statistical Characterization of Process-Induced Plasma Damage

Kim, Byungwhan; Kwon, Sang Hee; Kwon, Kwang Ho; Baek, Kyu-Ha; Lee, Jin Ho; Kim, Dong Hwan; May, Gary S.

ArticleIssue Date2009CitationMATERIALS AND MANUFACTURING PROCESSES, v.24, no.6, pp 610 - 614PublisherTAYLOR & FRANCIS INC
SCISCIESCOPUS
Study on surface modification of silicon using CHF3/O-2 plasma for nano-imprint lithography

Kim, Youngkeun; Kang, Sungchil; Ham, Yong-Hyun; Kwon, Kwang-Ho; Shutov, Dmitriy Alexandrovich; Lee, Hyun-Woo; Lee, Jae Jong; Do, Lee-Mi; Baek, Kyu-Ha

ArticleIssue Date2012CitationJOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, v.30, no.3PublisherA V S AMER INST PHYSICS
SCISCIESCOPUS
Surface characteristics of parylene-C films in an inductively coupled O-2/CF4 gas plasma

Ham, Yong-Hyun; Shutov, Dmitriy Alexandrovich; Baek, Kyu-Ha; Do, Lee-Mi; Kim, Kwangsoo; Lee, Chi-Woo; Kwon, Kwang-Ho

ArticleIssue Date2010CitationTHIN SOLID FILMS, v.518, no.22, pp 6378 - 6381PublisherELSEVIER SCIENCE SA
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