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SCISCIESCOPUS
A comparative study of CF4/O-2/Ar and C4F8/O-2/Ar plasmas for dry etching applications

Chun, Inwoo; Efremov, Alexander; Yeom, Geun Young; Kwon, Kwang-Ho

ArticleIssue Date2015CitationTHIN SOLID FILMS, v.579, pp 136 - 143PublisherELSEVIER SCIENCE SA
SCISCIESCOPUS
A Comparative Study of HBr-Ar and HBr-Cl-2 Plasma Chemistries for Dry Etch Applications

Efremov, Alexander; Kim, Youngkeun; Lee, Hyun-Woo; Kwon, Kwang-Ho

ArticleIssue Date2011CitationPLASMA CHEMISTRY AND PLASMA PROCESSING, v.31, no.2, pp 259 - 271PublisherSPRINGER
SCIESCOPUS
A Comparison of CF4, CHF3 and C4F8 + Ar/O-2 Inductively Coupled Plasmas for Dry Etching Applications

Lim, Nomin; Efremov, Alexander; Kwon, Kwang-Ho

ArticleIssue Date2021CitationPLASMA CHEMISTRY AND PLASMA PROCESSING, v.41, no.6, pp 1671 - 1689PublisherSPRINGER
SCISCIESCOPUS
A Model-Based Analysis of Plasma Parameters and Composition in HBr/X (X=Ar, He, N-2) Inductively Coupled Plasmas

Kwon, Kwang-Ho; Efremov, Alexander; Kim, Moonkeun; Min, Nam Ki; Jeong, Jaehwa; Kim, Kwangsoo

ArticleIssue Date2010CitationJOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.157, no.5, pp H574 - H579PublisherELECTROCHEMICAL SOC INC
SCISCIESCOPUS
A Model-Based Comparative Study of HCl and HBr Plasma Chemistries for Dry Etching Purposes

Efremov, Alexander; Kim, Joon Hyub; Kwon, Kwang-Ho

ArticleIssue Date2015CitationPLASMA CHEMISTRY AND PLASMA PROCESSING, v.35, no.6, pp 1129 - 1142PublisherSPRINGER
SCISCIESCOPUS
Ammonia-based plasma treatment of single-walled carbon nanotube thin films for bio-immobilization

Lee, Jaemin; Efremov, Alexander; Son, Ryeo Gang; Pack, Seung Pil; Lee, Hyun Woo; Kim, Kwangsoo; Kwon, Kwang-Ho

ArticleIssue Date2016CitationCARBON, v.105, pp 430 - 437PublisherPERGAMON-ELSEVIER SCIENCE LTD
SCISCIESCOPUS
Application of Si and SiO2 Etching Mechanisms in CF4/C4F8/Ar Inductively Coupled Plasmas for Nanoscale Patterns

Lee, Junmyung; Efremov, Alexander; Yeom, Geun Young; Lim, Nomin; Kwon, Kwang-Ho

ArticleIssue Date2015CitationJOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, v.15, no.10, pp 8340 - 8347PublisherAMER SCIENTIFIC PUBLISHERS
SCIESCOPUS
Comparative study of CF4 + O-2 and C6F12O + O-2 plasmas for reactive-ion etching applications

Lim, Nomin; Efremov, Alexander; Woo, Byungjun; Kwon, Kwang-Ho

ArticleIssue Date2022CitationPLASMA PROCESSES AND POLYMERS, v.19, no.2PublisherWILEY-V C H VERLAG GMBH
SCISCIESCOPUS
Degradation and modification of stainless-steel surface using Cl-2/Ar inductively coupled plasma

Jang, Hanbyeol; Efremov, Alexander; Yun, Sun Jin; Yeom, Geun Young; Kim, Kyoung Bo; Kwon, Kwang-Ho

ArticleIssue Date2013CitationAPPLIED SURFACE SCIENCE, v.279, pp 41 - 45PublisherELSEVIER SCIENCE BV
SCISCIESCOPUS
Dry etching characteristics of Mo and Al2O3 films in O-2/Cl-2/Ar inductively coupled plasmas

Kwon, Kwang-Ho; Efremov, Alexander; Yun, Sun Jin; Chun, Inwoo; Kim, Kwangsoo

ArticleIssue Date2014CitationTHIN SOLID FILMS, v.552, pp 105 - 110PublisherELSEVIER SCIENCE SA
SCIESCOPUS
Dry Etching Performance and Gas-Phase Parameters of C6F12O + Ar Plasma in Comparison with CF4 + Ar

Lim, Nomin; Choi, Yeon Sik; Efremov, Alexander; Kwon, Kwang-Ho

ArticleIssue Date2021CitationMATERIALS, v.14, no.7PublisherMDPI
SCISCIESCOPUS
Effect of Gas Mixing Ratio on Etch Behavior of Y2O3 Thin Films in Cl-2/Ar and BCl3/Ar Inductively Coupled Plasmas

Kim, Moonkeun; Efremov, Alexander; Hong, MunPyo; Min, Nam Ki; Park, Hyung-Ho; Baek, Kyu-Ha; Kwon, Kwang-Ho

ArticleIssue Date2010CitationJAPANESE JOURNAL OF APPLIED PHYSICS, v.49, no.8PublisherIOP PUBLISHING LTD
SCIESCOPUS
Effect of gas mixing ratio on etch behavior of ZrO(2) thin films in Cl(2)-based inductively coupled plasmas

Efremov, Alexander; Min, Nam-Ki; Jin, Sun; Kwon, Kwang-Ho

ArticleIssue Date2008CitationJOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, v.26, no.6, pp 1480 - 1486PublisherA V S AMER INST PHYSICS
SCIESCOPUS
Effect of gas mixing ratio on etch behavior of ZrO2 thin films in BCl3/He inductively coupled plasma

Kim, Mansu; Min, Nam-Ki; Yun, Sun Jin; Lee, Hyun Woo; Efremov, Alexander; Kwon, Kwang-Ho

ArticleIssue Date2008CitationJOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, v.26, no.3, pp 344 - 351PublisherA V S AMER INST PHYSICS
SCIESCOPUS
Effect of gas mixing ratio on etch behaviors of Ba2Ti9O20 (BTO) and Pt thin films in Cl-2/Ar inductively coupled plasma

Efremov, Alexander; Min, Nam-Ki; Kim, Sungihl; Kim, Mansu; Nahm, Sahn; Kwon, Kwang-Ho

ArticleIssue Date2008CitationMICROELECTRONIC ENGINEERING, v.85, no.7, pp 1584 - 1589PublisherELSEVIER SCIENCE BV
SCIESCOPUS
Etch mechanism of Ba(2)Ti(9)O(20) dielectric thin film in inductively coupled Cl(2)/Ar plasma

Efremov, Alexander; Kim, Mansu; Min, Nam-Ki; Kwon, Kwang-Ho

ArticleIssue Date2008CitationJOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.155, no.6, pp D468 - D473PublisherELECTROCHEMICAL SOC INC
SCISCIESCOPUS
Etch mechanism of In2O3 and SnO2 thin films in HBr-based inductively coupled plasmas

Kwon, Kwang-Ho; Efremov, Alexander; Kim, Moonkeun; Min, Nam Ki; Jeong, Jaehwa; Hong, MunPyo; Kim, Kwangsoo

ArticleIssue Date2010CitationJOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, v.28, no.2, pp 226 - 231PublisherA V S AMER INST PHYSICS
SCISCIESCOPUS
Etching Behavior and Mechanism of In- and Ga-Doped ZnO Thin Films in Inductively Coupled BCl3/Cl-2/Ar Plasmas

Kwon, Kwang-Ho; Efremov, Alexander; Kang, Sungchil; Jang, Hanbyeol; Yang, Hyungjin; Kim, Kwangsoo

ArticleIssue Date2012CitationJAPANESE JOURNAL OF APPLIED PHYSICS, v.51, no.7PublisherIOP PUBLISHING LTD
SCISCIESCOPUS
Etching characteristics and mechanism of indium tin oxide films in an inductively coupled HBr/Ar plasma

Kwon, Kwang-Ho; Efremov, Alexander; Ham, Yong-Hyun; Min, Nam Ki; Lee, Hyun Woo; Hong, Mun Pyo; Kim, Kwangsoo

ArticleIssue Date2010CitationJOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, v.28, no.1, pp 11 - 15PublisherA V S AMER INST PHYSICS
SCIESCOPUS
Etching Characteristics and Mechanism of InP in Inductively Coupled HBr/Ar Plasma

Lee, Hyun Woo; Kim, Mansu; Min, Nam-Ki; Efremov, Alexander; Lee, Chi-Woo; Kwon, Kwang-Ho

ArticleIssue Date2008CitationJAPANESE JOURNAL OF APPLIED PHYSICS, v.47, no.8, pp 6917 - 6922PublisherJAPAN SOCIETY APPLIED PHYSICS
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